Wafer Etching using Plasma Processing Methods: Part 1

In these videos, you will learn how to use VSim to design a plasma chamber for etching a wafer used in microelectronics. By using VSim, you can model the essential physics only possible by treating all plasma species kinetically. In Part 1 and Part 2, you will learn how to set up your own simulation. In Part 3 you will learn how to post-process the data by computing common diagnostics such as the Angular Energy Distribution Function and RF averaged potential.